PCB Etching Equipment and Wet processing equipment and Chemical Milling machine and Metal etchers


Photoresist developing cleaning drying Machine


Photoresist developing cleaning drying Machine

 

Features:Photoresist developing cleaning drying Machine can be built for use with all common aqueous resists, including: dry film photoresists, liquid resists, and dry film and liquid solder mask resists.

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Process flow: Load → Developing1,2 → pressure water washing→ city water washing → squeeze→ Cold & Hot Dry → Unload

Main technical parameter:
Model:GE-XY650
Power:380V/50HZ/60HZ
Working width:650mm
Working height:850mm (+/50mm adjust)
Min / Max board size:120*80mm / 500*500mm
Develop type:Double Spray with Oscillate system
Workpiece thickness:0.2~3.2mm
Working Temperature:35~55 ℃
Conveyor Speed:0.5~6m/min
Heater/Cooling Pipe:Titanium Pipe
Machine dimension :8000*1700*1850mm
Automatic Control System:
Working Speed Adjust system
Pressure Adjust System
Temperature control System
High temperature (up to 100) resists German PP material

PCB Developing Washing Drying Line,PCB developing machine,developing machine

  • Small film Developing MACHINE for PCB
  • Model Number: GE-S400D
  • Working size: W400mm*L (L= length is not limited)
  • developing area length: 500mm
  • Outsize: 1250*1100*1200mm
  • Machine process: Loading-Developing-Cleaning-Sponge drying-Unloading
  • PCB Developer Machine is used for PCB photoresist film developer work. auto spray imaging Machine.
  • Double Side Spray developing Machine
  • Model Number: GE-S650D
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Outsize: 2250*1280*1200mm
  • Machine process: Loading-Developing-Unloading
  • Double Side Spray developing Machine is used for metal plate and PCB photoresist film developer work. auto spray imaging Machine.
  • PCB developing machine use Sodium carbonate development
  • Model Number: GE-D650W
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Pump washing :500mm
  • city washing:500mm
  • Machine process: Load → Developing → water washing1,2 → squeeze → Unload
  • PCB developing machine use Sodium carbonate development ,with water washing
  • solder mask developing Machine with rinsing and drying
  • Model Number: GE-SRD650
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Outsize: 2850*1280*1200mm
  • Machine process: Load → Developing → water washing → squeeze→Air knife Drying → Unload
  • solder mask developing Machine with rinsing and drying used for PCB and other metal plate solder mask developing ,auto spray imaging Machine
  • Photoresist developing cleaning drying Machine
  • Model: GE-XY650
  • Working size: W650mm*L (L= length is not limited)
  • Machine process: Load → Developing → water washing → squeeze→cold & hot Drying → Unload
  • Machine dimension :8000*1700*1850mm
  • The Photoresist developing cleaning drying Machine can be built for use with all common aqueous resists, including: dry film photoresists, liquid resists, and dry film and liquid solder mask resists.