Features:Photoresist developing cleaning drying Machine can be built for use with all common aqueous resists, including: dry film photoresists, liquid resists, and dry film and liquid solder mask resists.
Process flow: Load → Developing1,2 → pressure water washing→ city water washing → squeeze→ Cold & Hot Dry → Unload
Main technical parameter:
Model:GE-XY650
Power:380V/50HZ/60HZ
Working width:650mm
Working height:850mm (+/50mm adjust)
Min / Max board size:120*80mm / 500*500mm
Develop type:Double Spray with Oscillate system
Workpiece thickness:0.2~3.2mm
Working Temperature:35~55 ℃
Conveyor Speed:0.5~6m/min
Heater/Cooling Pipe:Titanium Pipe
Machine dimension :8000*1700*1850mm
Automatic Control System:
Working Speed Adjust system
Pressure Adjust System
Temperature control System
High temperature (up to 100) resists German PP material
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Countact Us
Attn: Ms.Karen
E-mail: etchmachinery@163.com
Skype ID:lypretty1
Cell/Whatsapp/Wechat:+86-150 1060 8128
Fax: +86-10 6756 9148
ADD:Room701,B-Building,Greenland
Group,Xinghua Street,Daxing Disctrict,
Beijing,China