Three-in-one photoresist & solder mask developing line. 650mm working width, double-spray with oscillation, sodium carbonate chemistry 1–5%, integrated cascade rinse, 35–45°C . Suits 20–500 m²/day double-side PCB production.
The GE-XY650 is a 650mm photoresist and solder mask developing cleaning drying machine for PCB inner-layer, outer-layer, and solder mask imaging. It combines developing (Na2CO3 1–5% at 35–45°C, double-spray with oscillation), cascade rinse (35–45°C double-spray), and drying in a single conveyor. suitable for 20–500 m²/day double-side PCB production. Beijing Golden Eagle ships worldwide with CE certification and on-site installation support.
The GE-XY650 photoresist developing cleaning drying machine is a 650mm working-width conveyor system that performs developing, cascade rinse, and drying in a single line. It uses sodium carbonate (Na2CO3) chemistry at 1–5% concentration to dissolve unexposed dry-film or liquid solder-mask photoresist after exposure. The double-spray with oscillation design prevents streaking and delivers uniform developing across the panel, suitable for inner-layer, outer-layer, and solder-mask imaging on FR4 PCB panels up to 21" × 24" (533 × 610 mm).
Free installation training and technical support included.
Detailed specifications of the GE-XY650 photoresist & solder mask developing line.
| Parameter | GE-XY650 Specification |
|---|---|
| Model | GE-XY650 |
| Total Power | 20 kW |
| Power Supply | 380V / 50Hz / 3-phase (220V / 60Hz optional) |
| Working Width | 650 mm |
| Max Panel Size | 610 × 533 mm (24" × 21") |
| Min Panel Size | 200 × 150 mm |
| Developing Section | Length 1000 mm, double-spray with oscillation, 4 kW pump |
| Heater | Titanium pipe heater, 3 kW / unit |
| Working Temperature | 35 – 45 °C |
| Solution Concentration | Na2CO3 1% – 5% |
| Solution Conductivity | 15 ± 2 mS |
| Solution Temperature Stability | 35 ± 2 °C |
| Cascade Rinse Section | Length 1700 mm, double-spray, 2.2 kW pump |
| Rinse Working Temperature | 35 – 45 °C |
| Drying Section | Hot-air drying, integrated |
| Conveyor Speed | 0.5 – 4 m/min (adjustable) |
| Production Capacity | 20 – 500 m² / day (double-side) |
| Compatible Chemistry | Dry-film photoresist, liquid solder mask, Na2CO3 developer |
| Material of Construction | PP / PVDF spray bars, titanium heater, SUS304 frame |
| Control System | PLC + HMI touchscreen, automatic temperature & conductivity control |
| Lead Time | 30 – 60 working days |
| Warranty | 12 months from installation or 15 months from shipment |
Three-in-one developing, rinsing, and drying in a single 650mm conveyor — saves floor space, labour, and chemistry cost.
Developing chamber uses a top-and-bottom double-spray system with oscillation. Eliminates streaking and delivers uniform developing across the full 650mm panel width. Suitable for fine-line inner-layer imaging down to 50 μm line/space.
Standard Na2CO3 developer at 1–5% concentration, conductivity 15 ± 2 mS, temperature 35 ± 2 °C. Compatible with both dry-film photoresist (inner/outer layer) and liquid solder mask. Easy wastewater treatment (pH neutralization).
1700mm cascade rinse section with 2.2 kW double-spray pump. Counter-current water flow reduces DI water consumption by 30% compared to single-stage rinse. Automatic water level control maintains consistent rinse quality.
Titanium-pipe heater (3 kW) maintains developing solution at 35 ± 2 °C. PLC monitors and adjusts temperature in real time. Eliminates over- or under-developing caused by temperature drift, improving yield by 3-5%.
Conveyor speed 0.5–4 m/min, 20 m²/day (single panel, slow speed) to 500 m²/day (production batch, fast speed). Suitable for both R&D lab and high-volume production. Panel sizes 200×150 mm to 610×533 mm.
Optional CE certification. DDU shipping to your door. On-site installation, commissioning, and training by Golden Eagle engineers. 12-month warranty, lifetime technical support.
The GE-XY650 develops the developing step in a full DES (Develop-Etch-Strip) line. Pair it with Golden Eagle etching and stripping machines for a complete conveyor solution.
GE-XY650
This machine. Develops unexposed photoresist in Na2CO3 1–5% at 35–45 °C. Double-spray with oscillation.
FeCl3 or alkaline spray etching. Removes exposed copper. 650mm conveyor width, 25–35 μm/min etch rate. Pair with XY650 for same panel size.
NaOH or KOH solution at 50–70 °C. Removes remaining photoresist after etching. 80–150 panels/hour throughput.
The GE-XY650 is a photoresist and solder mask developing cleaning drying machine for PCB inner layer, outer layer, and solder mask imaging. It performs developing, cascade rinse, and drying in a single conveyor line, suitable for 20-500 m²/day double-side PCB production.
The GE-XY650 uses sodium carbonate (Na2CO3) at 1-5% concentration, conductivity 15±2 mS, and solution temperature 35±2°C. It is suitable for both dry-film photoresist and liquid solder mask developing.
The GE-XY650 has a working width of 650mm. It is designed for standard PCB panel sizes up to 21" x 24" (533 x 610mm) with margin.
The GE-XY650 uses double-spraying with oscillation in the developing chamber (1000mm long, 4kW pump, titanium-pipe heater). The cascade rinse section is 1700mm long with 2.2kW pump and double-spraying at 35-45°C. Oscillation prevents streaking and ensures uniform developing.
FOB price is USD 22,800 per set (excluding CE certification USD 1,000 and DDU shipping approx. USD 7,000). Delivery time is 30-60 working days from PO. The machine is suitable for 20-500 m²/day production and the configuration can be adjusted per customer requirement.
Tell us your PCB production volume, panel size, and target chemistry. We'll send you a tailored quotation within 24 hours.
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